Siliciumdioxid ≥99.995% (metals basis), sputtering target, Ø 50.8 mm (2.0 in), Thickness: 3.18 mm (0.125 in)

Leverandør: Thermo Scientific
Ratings: Ingen bedømmelse

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41096.KSEA 2810 DKK
41096.KS
Siliciumdioxid ≥99.995% (metals basis), sputtering target, Ø 50.8 mm (2.0 in), Thickness: 3.18 mm (0.125 in)
Siliciumdioxid

Magnetron sputtering source

Formel: SiO₂
Molekylvægt: 60,08 g/mol
Kogepunkt: 2230 °C (1013 hPa)
Smeltepunkt: 1719 °C
Massefylde: 2,2 g/cm³ (20 °C)
Opbevaringstemperatur: Stue temperatur
MDL Number: MFCD00011232
CAS-nummer: 7631-86-9
EINECS: 231-545-4
Merck Index: 14,08493

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