Siliciumdioxid ≥99.995% (metals basis), sputtering target, Ø 50.8 mm (2.0 in), Thickness: 3.18 mm (0.125 in)
Leverandør: Thermo Scientific
Ratings:
Ingen bedømmelse
Samlet vurdering
Gennemsntilig vurdering
41096.KSEA
2990
DKK
41096.KS
Siliciumdioxid ≥99.995% (metals basis), sputtering target, Ø 50.8 mm (2.0 in), Thickness: 3.18 mm (0.125 in)
Siliciumdioxid
Magnetron sputtering source
Formel:
SiO₂ Molekylvægt: 60,08 g/mol Kogepunkt: 2230 °C (1013 hPa) Smeltepunkt: 1719 °C Massefylde: 2,2 g/cm³ (20 °C) Opbevaringstemperatur: Stue temperatur |
MDL Number:
MFCD00011232 CAS-nummer: 7631-86-9 EINECS: 231-545-4 Merck Index: 14,08493 |
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